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TruPlasma RF 3006 radio frequency generator
TruPlasma RF 3006 radio frequency generator
Plasma excitation
TRUMPF Hüttinger

TruPlasma RF Series 1000 / 3000 (G2/13)

Stable processes for maximum productivity

The latest generation of RF generators

The decisive factor in coating or structuring surfaces is a stable and reproducible plasma current supply. RF generators of the TruPlasma RF Series 1000 / 3000 (G2/13) offer the best conditions for this with their state-of-the-art power electronics. Their stable output power and high control accuracy guarantee the best results while maintaining high levels of productivity.

A high level of accuracy and reproducibility

CombineLine technology: Optimal process power due to true 50 ohm output impedance.

Independence from the RF cable length

Adjusting the cable lengths is no longer necessary – an absolute innovation in the RF area.

Robust and safe

CombineLine technology: Reliable protection against reflected power in the event of mismatch.

Efficient and cost-effective

Efficiency of up to 80% enables energy costs to be decreased by up to 50%.

Blower-free cooling solution

No heating or contamination of the ambient air, meaning operation in clean rooms is also possible.

RF Generator TruPlasma RF 3006

Ideal for the coating of flat screens

TruPlasma Series RF 1000 / 3000 (G2/13) RF generators are perfectly suited for plasma processes such as reactive-ion etching (RIE), atomic layer deposition (ALD), plasma-enhanced chemical vapor deposition (PECVD), and RF sputtering. These processes are used, among other things, for manufacturing semi-conductor components and micro-electromechanical systems (MEMS) as well as for coating flat screens and solar cells.

Photovoltaic cell production

Typical area of application: The solar industry

Typical areas of application for the TruPlasma RF Series 1000 / 3000 (G2/13) include demanding PECVD, etching, and RF sputtering processes in the solar industry.

Perfectly suited to etching and coating processes

Semi-conductor production

Various plasma processes are used to manufacture semi-conductors, from removal processes such as dry etching to zone refining in the production of pure silicon. The TruPlasma RF Series 1000 / 3000 (G2/13) generators offer all of the conditions for a power supply that is stable and optimally adjusted to the respective process, ensuring that you achieve excellent, reproducible results.

TruPlasma RF 1000-2/13
TruPlasma RF 1000-3/13
RF output    
Output power 2 kW 3 kW
Rated power 2 kW 3 kW
Nominal load impedance 50 Ω 50 Ω
Output frequency 13.56 MHz 13.56 MHz
Network connection data    
Line voltage 200 - 480 V 200 - 480 V
Line frequency 50-60 Hz 50-60 Hz
Line input power 3.1 kVA 4.3 kVA
Power factor 0.95 0.95
Communication interfaces    
Sync interfaces yes yes
Analog/digital yes yes
RS 232 / RS 485 yes yes
PROFIBUS yes yes
EtherCAT yes yes
DeviceNet yes yes
Weight 18 kg 18 kg
IP protection class 30 30
Cooling requirements    
Maximum water pressure 7 bar 7 bar
Minimum pressure difference 1.1 bar 1.1 bar
Minimum flow rate 4 l/min 4 l/min
Coolant temperature 5 °C - 35 °C 1 5 °C - 35 °C 1
Overall efficiency 80 % 80 %
Certificates / standards SEMI S2, SEMI F47, UL, CSA, CE, RoHs SEMI S2, SEMI F47, UL, CSA, CE, RoHs
Ambient conditions    
Outside temperature 5 °C - 40 °C 5 °C - 40 °C
Humidity 5 % - 85 % 5 % - 85 %
Barometric pressure 79.5 kPa - 106 kPa 79.5 kPa - 106 kPa
Integrated CombineLine technology

Optimal adjustment to your process

Intelligent real-time matching of the TruPlasma RF Series 1000 / 3000 (G2/13) ensures fast and direct adjustment of the impedance to 50 ohms. The CombineLine technology reliably prevents plasma fluctuations and impurities; the blower-free cooling concept reduces the failure occurrence rate, while improving efficiency and enabling use in a clean room.

RF generator for parallel oscillating circuits

Maximum efficiency and flexibility

With maximum efficiencies of up to 80%, you can reduce your energy costs by up to 50%, compared with conventional generators. Numerous available interfaces (configurable analog interface, RS 232/485, DeviceNet, Profibus, EtherCAT) facilitate integration in existing systems; technical adjustments are not required due to the integrated ultra-wide range power packs (200-480 VAC). The high-power but nevertheless compact design (19-inch or ½-19-inch plug-in unit) enables space-saving integration into any production system.

TruPlasma RF_Systemport

TRUMPF SystemPort

SystemPort enables closed loop control through the measurement of the RF signal directly at the input and output of the matchbox. All measured values are available to the RF generator. This means all the process parameters can be better monitored, the matchbox protected, and early arc detection guaranteed. The entire RF system can therefore be controlled via a single generator interface.

Various options allow optimal adjustment of the RF generator to your application.

RF arc management

The well-grounded arc management is the ideal module for optimized plasma process control. Targeted arc detection guarantees the highest productivity possible, while protecting the product and the system at the same time.

Auto Frequency Tuning

The patented Auto Frequency Tuning solution enables simultaneous and fast frequency tuning and guarantees the optimal interaction between the generator and matchbox. Due to this patented technology, a local minimum is no longer an obstacle. The RF system is optimized and the best process results and a high level of reproducibility are guaranteed.

All components of the TRUMPF RF System are perfectly matched.

RF system solution: matchbox for the highest process stability
TruPlasma Match Series 1000 (G2/13) matchbox

TruPlasma Match matchboxes ensure an optimal transfer of power from the generator to the plasma discharge. The matchbox can be operated independently or via an intelligent generator/matchbox connection, the so-called SystemPort.

Master oscillator for the stabilization of critical synchronous plasma processes
Master oscillators

Master oscillators can be used to stabilize and optimize critical synchronous plasma processes. An integrated, digital frequency and phase synthesizer ensures excellent frequency and phase stability and supports the adjustment of the phase position with a very small increment. Various master oscillator designs for the frequency 13.56 MHz as well as different frequency combinations are available.

RF switches for the use of an RF generator at flexible plasma systems
RF switch

An RF switch supports the multiple use of an RF generator at various plasma process stations, for example, for providing power to sequential processes, or on systems with various feed points. Various RF switches are available in two power classes and with 2, 3, or 4 outputs.

Coaxial cable for the transfer of the specified power
Coaxial cable

TRUMPF Hüttinger offers coaxial cables that are specifically designed for operation in 50-ohm systems for RF power transmission.

Generator and matchbox: A perfectly matched system solution

Perfectly matched: The TRUMPF RF System

Plasma processes behave like a complex, variable load, to which the power supply from the generator needs to be continually adjusted. Active matchboxes handle this task, ensuring precise adjustment to the optimal impedance of 50 ohms at all times. The result is a perfectly matched system solution, the TRUMPF RF System. The generator and matchbox can be easily integrated into your existing process environment via various interfaces, including EtherCAT. You can also gain an optimized system solution through an intelligent generator/matchbox connection, the so-called SystemPort.

This product range and information may vary depending on the country. Subject to changes to technology, equipment, price, and range of accessories. Please get in touch with your local contact person to find out whether the product is available in your country.

  • The cooling water temperature must exceed the dew point of the room air temperature to ensure no condensation.

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