MF Plasma Excitation from TRUMPF Hüttinger is above all used in dual cathode systems, for example, dual magnetron sputtering.
DC Pulsed Plasma Excitation from TRUMPF Hüttinger is ideally suited for use in numerous reactive processes.
Direct current generators from TRUMPF Hüttinger are classics when it comes to DC plasma excitation.
TruPlasma radio frequency generators from TRUMPF Hüttinger provide the highest process stability of all power supplies for plasma excitation.
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