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RF system solution: matchbox for the highest process stability
RF system solution: matchbox for the highest process stability
Plasma excitation
TRUMPF Hüttinger

TruPlasma Match Series 1000 (G2/13)

Intelligent matching through real-time measurement

RF system solution from a single source

The new TruPlasma Match Series 1000 (G2/13) matchboxes represent the ideal complement to RF generators from TRUMPF Hüttinger. Their intelligent matching algorithm and digital control platform for process monitoring provide a comprehensive solution in which all of the components work together optimally – the TRUMPF RF system.

Intelligent matching algorithm

Fast, stable and reproducible impedance matching to 50 ohms, even in critical processes.

Optimal interaction of the entire system

Progressive software and improved communication between the generator and matchbox.

Real-time measurement of RF power

Fast tracking of the system for every change in the impedance of the matchbox and the load.

Closed loop control

Optimal monitoring of the process parameters as well as early arc detection.

User-friendly process monitoring

Graphical user interface and effective tools (Smith diagram, real-time oscilloscope).

RF system solution: matchbox for the highest process stability

Production of semi-conductors, photovoltaic cells and flat screens

Stable plasma processes are crucial during the production of semi-conductors, photovoltaic cells and flat screens. In conjunction with TRUMPF Hüttinger RF generators, the TruPlasma Match Series 1000 (G2/13) matchboxes offer a comprehensive solution for the highest process stability and productivity.

Support for hard material coating: matchboxes of the TruPlasma Match Series 1000 (G2/13)

Application of hard material and wear-resistant coatings

The application of functional coats gives heavy-duty workpieces increased mechanical hardness as well as better thermal and chemical stability. In conjunction with a TRUMPF Hüttinger RF generator, TruPlasma Match Series 1000 (G2/13) matchboxes ensure perfect coating quality.

Perfect for large-scale coating: matchboxes of the TruPlasma Match Series 1000 (G2/13)

Ablation and coating of surfaces

TruPlasma Match Series 1000 (G2/13) matchboxes can be used in all standard plasma processes to coat or ablate surfaces – such as plasma etching, reactive ion etching, ALD, PECVD, RF sputtering, and photoresist plasma ashing. When combined with a TRUMPF Hüttinger RF generator it provides optimal process results.

- / -
RF output        
Output power 6 kW 12 kW 24 kW 3 kW
Rated power 6 kW 12 kW 24 kW 3 kW
Output frequency 13.56 MHz 13.56 MHz 13.56 MHz 13.56 MHz
Network connection data        
Line voltage (±10%) 23.5 V - 24.5 V (±10%) 87 V - 264 V (±10%) 87 V - 264 V (±10%) 23.5 V - 24.5 V
Line frequency 50 Hz - 60 Hz 50 Hz - 60 Hz 50 Hz 50 Hz - 60 Hz
Communication interfaces        
Sync interfaces Yes Yes Yes Yes
Analog/digital Yes Yes Yes Yes
RS 232 / RS 485 Yes Yes Yes Yes
PROFIBUS Yes Yes Yes Yes
EtherCAT Yes Yes Yes Yes
DeviceNet No No No No
Housing        
Weight 8 kg 27 kg 30 kg 15 kg
IP protection class 21 21 21 21
Cooling requirements        
Max. water pressure - 6 bar 6 bar -
Min. pressure difference - 1.5 bar 1.5 bar -
Min. flow rate - 3.5 l/min 5 l/min -
Cooling medium temperature - 10 °C - 30 °C 1 10 °C - 30 °C 1 -
General        
Certificates / standards CE, EN61010, SEMI S2, SEMI F47 CE, EN61010, SEMI S2, SEMI F47 CE, EN61010, SEMI S2, SEMI F47 CE, EN61010, SEMI S2, SEMI F47
Ambient conditions        
Outside temperature 10 °C - 35 °C 10 °C - 35 °C 10 °C - 35 °C 10 °C - 35 °C
Humidity 20 % - 75 % 20 % - 75 % 20 % - 75 % 20 % - 75 %
Barometric pressure 800 kPa - 1013 kPa 800 kPa - 1013 kPa 800 kPa - 1013 kPa 800 kPa - 1013 kPa
PDF <1MB
Technical data sheet

The technical data of all product versions as a download.

Always guarantees the full power output of the RF generator

Perfect process control at all times

The matchbox ensures fast and direct impedance adjustment to 50 ohms at all times – thus guaranteeing the full power output of the RF generator in the process. The seamless communication between the matchbox and the generator enables optimal process monitoring and early arc detection.

User-friendly software TruControl Power

All parameters at a glance

The real time measurement of RF input and output power indicates dynamic impedance changes, and cooling sensors enable a reliable prediction of power loss. Thanks to the graphical operating software with complex display options (Smith chart, real-time oscilloscope), you have an overview all of the relevant process parameters.

TruPlasma RF_Systemport

TRUMPF SystemPort

SystemPort enables closed loop control through the measurement of the RF signal directly at the input and output of the matchbox. All measured values are available to the RF generator. This means all the process parameters can be better monitored, the matchbox protected and early arc detection guaranteed. The entire RF system can therefore be controlled via a single generator interface.

Various options enable optimal adjustment of the TRUMPF RF system to your application.

RF current metering

Highly accurate AC current metering to detect plasma anomalies, placed in the matchbox close to the process, directly at the chamber.

Arc management

The well-grounded arc management is the ideal module for optimised plasma process control. Targeted arc detection guarantees the highest productivity possible, whilst protecting the product and the system at the same time.

Interfaces

Analogue/digital, PROFIBUS, and EtherCAT are available as optional interfaces. The standard interfaces are EtherNet, SystemPort and RS232/485.

User-friendly software TruControl Power

TruControl Power

The user-friendly TruControl Power control software enables the convenient start-up and secure monitoring of the RF generator or the entire TRUMPF RF system during the ongoing process.

User-friendly software TruControl Power

Graphical operating software

Complex graphical depictions enable comprehensive control of all relevant process parameters. Load and matchbox impedance are visualised using a Smith diagram, the RF input and output power, including frequency and phase position, with the help of a real-time oscilloscope.

The TRUMPF RF system, comprised of an RF generator and a matchbox, forms a perfectly matched overall system for the best process results.

User-friendly software TruControl Power
Graphical operating software

Complex graphical depictions enable comprehensive control of all relevant process parameters. Load and matchbox impedance are visualised using a Smith diagram, the RF input and output power, including frequency and phase position, with the help of a real-time oscilloscope.

Master oscillator for the stabilisation of critical synchronous plasma processes
Master oscillators

Master oscillators can be used to stabilise and optimise critical synchronous plasma processes. An integrated, digital frequency and phase synthesiser ensures excellent frequency and phase stability and supports the adjustment of the phase position with a very small increment. Various master oscillator designs for the frequency 13.56 MHz as well as different frequency combinations are available.

RF switches for the use of an RF generator on flexible plasma systems
RF switch

An RF switch supports the multiple use of an RF generator at various plasma process stations, for example, for providing power to sequential processes or on systems with various feed points. Various RF switches are available in two power classes and with 2, 3 or 4 outputs.

Coaxial cable for the transfer of the specified power
Coaxial cable

TRUMPF Hüttinger offers coaxial cables that are specifically designed for operation in 50-ohm systems for RF power transmission.

Generator and matchbox: a perfectly matched system solution

Optimal control of the plasma process

Plasma processes behave like a complex, variable load, to which the power supply from the generator needs to be continually adjusted. Active matchboxes handle this task, ensuring precise adjustment to the optimal impedance of 50 ohms at all times. The result is a perfectly matched system solution, the TRUMPF RF System. The generator and matchbox can be easily integrated into your existing process environment via various interfaces, including EtherCAT. You can also gain an optimised system solution through an intelligent generator/matchbox connection, the so-called SystemPort.

This product range and information may vary depending on the country. Subject to changes to technology, equipment, price, and range of accessories. Please get in touch with your local contact person to find out whether the product is available in your country.

Footnotes
  • The cooling water temperature must exceed the dew point of the room air temperature to ensure no condensation.

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Contact

Klaus Nock
Plasma Sales
Fax +49 761 89711150
E-mail

Downloads

TruPlasma RF System brochure
TruPlasma RF System brochure
pdf - 6 MB
Service & contact

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