You have selected India. Based on your configuration, United States might be more appropriate. Do you want to keep or change the selection?

Epitaxy | TRUMPF

Epitaxy

Clean growth layer by layer

Epitaxy

Epitaxy is a process in which single crystalline layers, e.g. of silicon, are created on single crystal substrates of the same material. The substrates are located on an inductively heated graphite susceptor. This requires a very high degree of temperature homogeneity. Epitaxy is used, for example, in manufacturing LEDs. TRUMPF Hüttinger medium-frequency generators provide the necessary process energy reliably and stably.

Products

Contact
Dr. Torge Behrens
Induction heating
E-mail
Service & contact