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Quick Thin Film Deposition


Thin films can be applied to materials of varying qualities by using CVD technology (Chemical Vapor Deposition). Here, a solid film is created from gaseous materials and is deposited as a crystal or amorphous film on the material (substrate) to be coated. In traditional CVD coating processes, the process gas breaks up into its reaction products only on the heated substrate.

In plasma enhanced CVD (PECVD) processes, however, the gas molecules dissociate themselves under the influence of the plasma. They then react toward the film material and deposit themselves on the substrate. The coating process is faster with a higher utilization of the process gas.

PECVD operates at substantially lower temperatures than CVD without plasma. In PECVD processes, the temperatures may be below 500°C, which protects the substrate materials to be coated.


TruPlasma RF 1003: Hochfrequenzgenerator für maximale Produktivität
TruPlasma RF Series 1000 / 3000 (G2/13)

Stable processes for maximum productivity

Hochfrequenzgenerator TruPlasma RF 3024
TruPlasma RF Series 3000

RF technology without compromises

Bipolar-Generator TruPlasma Bipolar 4040
TruPlasma Bipolar Series 4000 (G2)

Maximum power on a flexible wave

Gepulster Generator der TruPlasma DC Serie 4000
TruPlasma DC Series 4000

Crystal clear: pulsed processes for perfect surfaces

TruPlasma DC 4040 (G2)
TruPlasma DC Series 4000 (G2)

Pulsed processes for brilliant surfaces

Gleichstrom-Generator TruPlasma DC 3040
TruPlasma DC Series 3000 (G2)

Perfection for all surfaces

Gleichstrom-Generator für anspruchsvolle Plasmaprozesse: TruPlasma DC 3010
TruPlasma DC Series 3000

Compact and reliable


Dr. Daniel Krausse
Plasma RF

Dr. Jan Peter Engelstädter
Plasma MF
Service & contact