You have selected India. Based on your configuration, United States might be more appropriate. Do you want to keep or change the selection?

DC Pulsed Plasma Excitation | TRUMPF
Technologiebild DC gepulste Plasmageneratoren

DC Plasma Excitation

DC Pulsed Plasma Excitation from TRUMPF Hüttinger is ideally suited for use in numerous reactive processes. In contrast to simple direct current generators, pulsed direct current enables the processing of semi and non-conducting materials, such as oxides. Common applications for pulse generators include hard material coating, as well as etching and coating processes in semi-conductor production.

Generator in the TruPlasma Highpulse Series 4000

TruPlasma Highpulse Series 4000 (G2)

The process power supplies of the TruPlasma Highpulse Series 4000 (G2) deliver particularly corrosion-resistant and wear-resistant hard material coatings and are the first choice for HiPIMS applications. In combination with polarized substrates, the TruPlasma Highpulse Series 4000 (G2) can also serve semi-conductor applications such as trench filling, surface pretreatment, and etching.

Generator in the TruPlasma Highpulse Series 4000

TruPlasma Highpulse Series 4000

The generators in the TruPlasma Highpulse Series 4000 are the first choice for HIPIMS applications. They provide particularly corrosion-resistant and wear-resistant hard material coatings. In combination with polarized substrates, the TruPlasma Highpulse Series 4000 can also operate semi-conductor applications, such as etching, pre-treatment of surfaces, and trench filling.

TruPlasma DC 4000 (G2)

TruPlasma DC Series 4000 (G2)

The TruPlasma DC Series 4000 (G2) combines the excellent arc handling of TRUMPF Hüttinger with the advantages of DC pulse technology. This means you gain improved coating results with fewer defects, along with a higher deposition rate. The results are brilliant surfaces and a high level of production power.

Service & contact