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TruPlasma Highpulse Series 4000 (G2) | TRUMPF
TruPlasma Highpulse Series 4000 generator (G2)
TruPlasma Highpulse Series 4000 generator (G2)
Plasma excitation
TRUMPF Hüttinger

TruPlasma Highpulse Series 4000 (G2)

Superior coating results due to high-density plasma

The first choice for HiPIMS applications

The generators of the TruPlasma Highpulse Series 4000 (G2) can be used in existing magnetron systems without changes as an alternative to DC sputter generators. They provide highly corrosion-resistant and wear-resistant hard material coatings and are therefore the first choice for high-power impulse magnetron sputtering applications.

Impeccable coating results

Impeccable peak powers of up to 4 megawatts generate extreme plasma densities with high ion fluxes.

Can be used with flexibility

Simple adaptation to existing cathode systems and process conditions enables optimal device integration.

The first choice for HiPIMS applications

As the latest development in pulsed PVD sputtering processes, HiPIMS offers particularly corrosion-resistant and wear-resistant hard material coatings.

For a variety of applications

Can also be used in DC mode, no additional DC generator required.

Generators in the TruPlasma Highpulse Series 4000 in use

Hard material coatings

The addition of functional coats gives heavy-duty workpieces increased surface hardness and static friction, as well as better thermal and chemical stability. The generators of the TruPlasma Highpulse Series 4000 (G2) ensure an extremely stable plasma process and thus outstanding coating quality.

Photovoltaic cell production


In the photovoltaics and semi-conductor sectors, there are numerous areas of application for tailored process energy. The generators of the TruPlasma Highpulse Series 4000 (G2) can be optimally adapted to the respective process and enable excellent coating parameters and high productivity.

Ideal for large area coating

Glass coatings

Coating large areas of architectural glass using a PVD plasma process puts especially high demands on the process power supply. The generators of the TruPlasma Highpulse Series 4000 (G2) offer the ideal conditions for a high-quality coating result.

Architectural glass

Optimal process results

High peak powers generate highly ionized plasma and enable high ion fluxes. This allows very coherent and dense films to be achieved without droplets. In combination with polarized substrate configurations, the TruPlasma Highpulse Series 4000 (G2) generators offer superior results in etching and trench-filling applications.

Arc management

Fully digital arc management

Adjustable pulse duration and frequency, advanced power parameters, and fully digital arc management with very low arc energy enable drop-free sputtering, minimal film defects, and guarantee high coat qualities and deposition rates.

RF generator for parallel oscillating circuits

Excellent coatings

High energy and high voltages of up to 2 kV enable the production of high-quality coatings – both in small laboratories and in large industrial plants. Pulses of up to 5 ms and frequencies up to 10 kHz increase the deposition rate and help to reduce the total cost of ownership.

Photovoltaic cell production

High process stability

The power regulation with adjustable frequency ensures that the deposition parameters remain constant, even in demanding reactive processes. Thus, processes remain stable for hours or even days with no intervention required.

A compact unit

The generators of the TruPlasma Highpulse Series are a single unit in a compact size. They do not require an external DC power supply, are completely water cooled, and thus allow working in a clean room.

Various options ensure optimum adaptation of the Tru Plasma Highpulse Series 4000 (G2) to your application.

Simple process adjustment
Arc management CompensateLine (CLC)

Completely digital arc management with very low arc energy ensures high coating quality and deposition rates.

Graphical operating software PVD Power

PVD Power

The user-friendly, multilingual PVD Power software offers you numerous operation, configuration and diagnosis options for optimizing process quality and effective error correction: display of actual values for all relevant process parameters as well as warnings and alarms, specification of nominal values by the operator, as well as recording and visualization of important operating parameters with high temporal resolution (oscilloscope function).

This product range and information may vary depending on the country. Subject to changes to technology, equipment, price and range of accessories. Please get in touch with your local contact person to find out whether the product is available in your country.

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Anna-Luisa Neven-du Mont
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