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RF system solution: matchbox for the highest process stability
RF system solution: matchbox for the highest process stability
Plasma excitation
TRUMPF Hüttinger

TruPlasma Match Series 1000 (G2/13)

Intelligent matching through real-time measurement

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    • Overview
    • Applications
    • Technical Data
    • Customer benefits
    • Options
    • Software
    • System components
    • RF system
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    RF system solution from a single source

    The new TruPlasma Match Series 1000 (G2/13) matchboxes represent the ideal complement to RF generators from TRUMPF Hüttinger. Their intelligent matching algorithm and digital control platform for process monitoring provide a comprehensive solution in which all of the components work together optimally – the TRUMPF RF system.

    Intelligent matching algorithm

    Fast, stable, and reproducible impedance matching to 50 ohms, even in critical processes.

    Optimal interaction of the entire system

    Progressive software and improved communication between the generator and matchbox.

    Real-time measurement of RF power

    Fast system tracking for every change in the impedance of the matchbox and the load.

    Closed loop control

    Optimal monitoring of the process parameters as well as early arc detection.

    User-friendly process monitoring

    Graphical user interface and effective tools (Smith diagram, real-time oscilloscope).

    RF system solution: matchbox for the highest process stability

    Production of semi-conductors, photovoltaic cells, and flat screens

    Stable plasma processes are crucial during the production of semi-conductors, photovoltaic cells, and flat screens. In conjunction with TRUMPF Hüttinger RF generators, the TruPlasma Match Series 1000 (G2/13) matchboxes offer a comprehensive solution for the highest process stability and productivity.

    Support for hard material coating: Matchboxes of the TruPlasma Match Series 1000 (G2/13)

    Application of hard material and wear-resistant coatings

    The application of functional coats gives heavy-duty workpieces increased mechanical hardness as well as better thermal and chemical stability. In conjunction with an RF generator from TRUMPF Hüttinger, TruPlasma Match Series 1000 (G2/13) matchboxes ensure perfect coating quality.

    Perfect for large-scale coating: Matchboxes of the TruPlasma Match Series 1000 (G2/13)

    Ablation and coating of surfaces

    TruPlasma Match Series 1000 (G2/13) matchboxes can be used in all standard plasma processes to coat or ablate surfaces – such as plasma etching, reactive ion etching, ALD, PECVD, RF sputtering, and photoresist plasma ashing. When combined with a TRUMPF Hüttinger RF generator it provides optimal process results.

    RF output        
    Output power 6 kW 12 kW 24 kW 3 kW
    Rated output 6 kW 12 kW 24 kW 3 kW
    Output frequency 13.56 MHz 13.56 MHz 13.56 MHz 13.56 MHz
    Network connection data        
    Line voltage (±10%) 23.5 V - 24.5 V (±10%) 87 V - 264 V (±10%) 87 V - 264 V (±10%) 23.5 V - 24.5 V
    Line frequency 50 Hz - 60 Hz 50 Hz - 60 Hz 50 Hz 50 Hz - 60 Hz
    Communication interfaces        
    Sync interfaces Yes Yes Yes Yes
    Analog/digital Yes Yes Yes Yes
    RS 232 / RS 485 Yes Yes Yes Yes
    PROFIBUS Yes Yes Yes Yes
    EtherCAT Yes Yes Yes Yes
    DeviceNet No No No No
    Housing        
    Weight 8 kg 27 kg 30 kg 15 kg
    IP protection class 21 21 21 21
    Cooling requirements        
    Max. water pressure - 6 bar 6 bar -
    Min. pressure differential - 1.5 bar 1.5 bar -
    Min. flow rate - 3.5 l/min 5 l/min -
    Coolant temperature - 10 °C - 30 °C 1 10 °C - 30 °C 1 -
    General        
    Certificates / standards CE, EN61010, SEMI S2, SEMI F47 CE, EN61010, SEMI S2, SEMI F47 CE, EN61010, SEMI S2, SEMI F47 CE, EN61010, SEMI S2, SEMI F47
    Ambient conditions        
    Outside temperature 10 °C - 35 °C 10 °C - 35 °C 10 °C - 35 °C 10 °C - 35 °C
    Humidity 20 % - 75 % 20 % - 75 % 20 % - 75 % 20 % - 75 %
    Barometric pressure 800 kPa - 1013 kPa 800 kPa - 1013 kPa 800 kPa - 1013 kPa 800 kPa - 1013 kPa
    PDF <1MB
    Technical data sheet

    The technical data of all product versions as a download.

    Always guarantees the full power output of the RF generator

    Perfect process control at all times

    The matchbox ensures fast and direct impedance adjustment to 50 ohms at all times – thus guaranteeing the full power output of the RF generator in the process. The seamless communication between the matchbox and the generator enables optimal process monitoring and early arc detection.

    User-friendly software TruControl Power

    All parameters at a glance

    The real time measurement of RF input and output power indicates dynamic impedance changes, and cooling sensors enable a reliable prediction of power loss. With the graphical operating software with complex display options (Smith chart, real time oscilloscope), you have an overview all of the relevant process parameters.

    TruPlasma RF_Systemport

    TRUMPF SystemPort

    SystemPort enables closed loop control through the measurement of the RF signal directly at the input and output of the matchbox. All measured values are available to the RF generator. This means all the process parameters can be better monitored, the matchbox protected, and early arc detection guaranteed. The entire RF system can therefore be controlled via a single generator interface.

    Various options enable optimal adjustment of the TRUMPF RF system to your application.

    RF current metering

    Highly accurate AC current metering to detect plasma anomalies, placed in the matchbox close to the process, directly at the chamber.

    Arc management

    The well-grounded arc management is the ideal module for optimized plasma process control. Targeted arc detection guarantees the highest productivity possible, while protecting the product and the system at the same time.

    Interfaces

    Analog/digital, PROFIBUS, and EtherCAT are available as optional interfaces. The standard interfaces are EtherNet, SystemPort, and RS232/485.

    User-friendly software TruControl Power

    TruControl Power

    The user-friendly TruControl Power, control software, enables the convenient start-up and secure monitoring of the RF generator or the entire TRUMPF RF system during processing.

    User-friendly software TruControl Power

    Graphical operating software

    Complex graphical depictions enable comprehensive control of all relevant process parameters. Load and matchbox impedance are visualized using a Smith diagram, the RF input and output power, including frequency and phase position, with the help of a real time oscilloscope.

    The TRUMPF RF system, comprised of an RF generator and a matchbox, forms a perfectly matched overall system for the best process results.

    User-friendly software TruControl Power
    Graphical operating software

    Complex graphical depictions enable comprehensive control of all relevant process parameters. Load and matchbox impedance are visualized using a Smith diagram, the RF input and output power, including frequency and phase position, with the help of a real time oscilloscope.

    Master oscillator for the stabilization of critical synchronous plasma processes
    Master oscillators

    Master oscillators can be used to stabilize and optimize critical synchronous plasma processes. An integrated, digital frequency and phase synthesizer ensures excellent frequency and phase stability and supports the adjustment of the phase position with a very small increment. Various master oscillator designs for the frequency 13.56 MHz as well as different frequency combinations are available.

    RF switches for RF generator use in flexible plasma systems.
    RF switch

    An RF switch supports the multiple use of an RF generator at various plasma process stations, for example, for providing power to sequential processes, or on systems with various feed points. Various RF switches are available in two power classes and with 2, 3, or 4 outputs.

    Coaxial cable for the transfer of the specified power
    Coaxial cable

    TRUMPF Hüttinger offers coaxial cables that are specifically designed for operation in 50-ohm systems for RF power transmission.

    Generator and matchbox: A perfectly matched system solution

    Optimal control of the plasma process

    Plasma processes behave like a complex, variable load, to which the power supply from the generator needs to be continually adjusted. Active matchboxes handle this task, ensuring precise adjustment to the optimal impedance of 50 ohms at all times. The result is a perfectly matched system solution, the TRUMPF RF System. The generator and matchbox can be easily integrated into your existing process environment via various interfaces, including EtherCAT. You can also gain an optimized system solution through an intelligent generator/matchbox connection, the so-called SystemPort.

    This product range and information may vary depending on the country. Subject to changes to technology, equipment, price, and range of accessories. Please get in touch with your local contact person to find out whether the product is available in your country.

    Footnotes
    • The cooling water temperature must exceed the dew point of the room air temperature to ensure no condensation.

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    Contact

    Klaus Nock
    Plasma Sales
    Fax +49 761 89711150
    E-mail

    Downloads

    TruPlasma RF System brochure
    TruPlasma RF System brochure
    pdf - 6 MB
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