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VHF Generator Series 3000
VHF Generator Series 3000
Plasma excitation
TRUMPF Hüttinger

TruPlasma VHF Series 3000

Meeting every need

    - / -
    • Overview
    • Applications
    • Technical Data
    • Customer benefits
    • Options
    • Software
    • System components
    • RF system
    • More Less
    Innovative, modular, scalable: the new generator platform from TRUMPF Hüttinger

    The TruPlasma VHF Series 3000 generators are based on an innovative platform concept that enables the highest level of power density and meets the most demanding process requirements. The modular and purely water-cooled construction enables the output power to be scaled to up to 80 kW. These compact VHF generators are also very cost-effective and have a robust design.

    Precise and fast arbitrary pulse shapes

    This provides the best plasma process control for the present single and multi-level pulsing.

    Minimal ramp time < 150 ns

    This means extremely flexible control of the generator ignition behavior is possible.

    Smart auto frequency tuning

    Automatic frequency tuning for optimal interaction between the generator and the matchbox.

    Reliable and sophisticated process control

    Excellent, reproducible process results due to highly precise digital frequency modulation.

    Independent of cable length

    The length of the RF cable does not need to be adapted when the process is changed, resulting in short setup times.

    Robust design

    Reliable generator function even in the event of mismatch due to CombineLine technology.

    Typical area of application of the TruPlasma VHF Series 3000: Photovoltaic cell production

    Production of photovoltaic cells

    There are numerous areas of application for tailored process energy in the photovoltaic field. Here, various plasma processes are used to add and remove materials, such as sputtering, PECVD and etching. The TruPlasma VHF Series 3000 generators can be adapted optimally to the respective process, with fast arc management allowing for stable control of the plasma. As a result, excellent process results and high productivity are guaranteed.

    Perfectly suited to etching and coating processes

    Semi-conductor production

    Various plasma processes are used to manufacture semi-conductors, from removal processes such as dry etching to zone refining in the production of pure silicon. TruPlasma VHF Series 3000 generators offer all of the conditions for a power supply that is stable and optimally adjusted to the respective process, ensuring that you achieve excellent, reproducible results.

    First-rate MF power supply for the coating of flat screens

    Ideal for the coating of flat screens

    The TruPlasma VHF Series 3000 generators are perfectly suited for plasma processes such as reactive-ion etching (RIE), atomic layer deposition (ALD), plasma-enhanced chemical vapor deposition (PECVD), and RF sputtering. These processes are used, among other things, for manufacturing semi-conductor components and micro-electromechanical systems (MEMS) as well as for coating flat screens and solar cells.

    TruPlasma VHF 3005
    RF output  
    Output power 5 kW
    Rated output 5 kW
    Nominal load impedance 50 Ω
    Output frequency 40.68 MHz
    Network connection data  
    Line voltage 200 - 480 V
    Line frequency 50-60 Hz
    Network input power 18 kVA
    Power factor 0.95
    Communication interfaces  
    Sync interfaces Yes
    Analog/digital Yes
    RS 232 / RS 485 Yes
    PROFIBUS Yes
    EtherCAT Yes
    DeviceNet Yes
    Housing  
    Weight 55 kg
    IP protection class 30
    Cooling requirements  
    Max. water pressure 7 bar
    Min. pressure differential 2 bar
    Min. flow rate 8 l/min
    Coolant temperature 5 °C - 35 °C 1
    General  
    Overall efficiency 75 %
    Certificates / standards SEMI S2, SEMI F47, UL, CE, RoHs
    Ambient conditions  
    Outside temperature 5 °C - 40 °C
    Humidity 5 % - 85 %
    Barometric pressure 79.5 kPa - 106 kPa
    PDF <1MB
    Technical data sheet

    The technical data of all product versions as a download.

    Combine-Line technology of the TruPlasma VHF Series 3000

    Flexible adaptation to the process

    The modular platform concept of the TruPlasma VHF Series 3000 enables the output power to be scaled to up to 80 kW. With CombineLine technology, the generator is also very robust, even in the event of a mismatch. Its wide frequency range, variable line voltage, and cable length mean it can be adjusted for use in various applications and countries.

    RF generator for parallel oscillating circuits

    Extremely efficient and cost-effective

    TruPlasma VHF Series 3000 RF generators are built with the latest semi-conductor technology with LDMOS power transistors. The highly integrated planar technology enables the highest power density level with high energy efficiency, and a correspondingly reduced need for cooling capacity. As a result, this family offers unparalleled cost-effectiveness in this frequency range and reduces common operating costs.

    TruPlasma RF_Systemport

    TRUMPF SystemPort

    SystemPort enables closed loop control through the measurement of the RF signal directly at the input and output of the matchbox. All measured values are available to the RF generator. This means all the process parameters can be better monitored, the matchbox protected, and early arc detection guaranteed. The entire RF system can therefore be controlled via a single generator interface.

    Various options enable optimal adjustment of the VHF generator to your application.

    Smart auto frequency tuning

    The patented Auto Frequency Tuning solution enables simultaneous and fast frequency tuning and guarantees the optimal interaction between the generator and matchbox. Due to this patented technology, a local minimum is no longer an obstacle: The RF system is optimized and the best process results and a high level of reproducibility are guaranteed.

    Arc management

    The well-grounded arc management is the ideal module for optimized plasma process control. Targeted arc detection guarantees the highest productivity possible, while protecting the product and your system at the same time.

    Flexible pulse shapes

    Flexible pulse shapes: the shape of the output signal can be adjusted to meet any process requirement.

    User-friendly software TruControl Power

    TruControl Power

    The user-friendly TruControl Power, control software, enables the convenient start-up and secure monitoring of the RF generator or the entire TRUMPF RF system during processing.

    By selecting suitable system components, you can perfectly adjust the VHF generator to your application requirements.

    RF system solution: Matchbox for the highest process stability
    Matchbox

    TruPlasma Match matchboxes ensure an optimal transfer of power from the generator to the plasma discharge. The matchbox can be operated independently or via an intelligent generator/matchbox connection, the so-called SystemPort.

    Accessory kit for the TruPlasma VHF Series
    Accessory kit

    This is comprised of an adapter for water connections, a HARTING AC supply set, a jumper for the the interlock function, and an adapter from LEMO EPL to BNC female (for clock and pulse sync plugs).

    Master oscillator for the stabilization of critical synchronous plasma processes
    Master oscillators

    Master oscillators can be used to stabilize and optimize critical synchronous plasma processes. An integrated, digital frequency and phase synthesizer ensures excellent frequency and phase stability and supports the adjustment of the phase position with a very small increment. Various master oscillator designs for the frequency 13.56 MHz as well as different frequency combinations are available.

    VHF Generator Series 3000
    RF switch

    An RF switch supports the multiple use of an RF generator at various plasma process stations, for example, for providing power to sequential processes, or on systems with various feed points. Various RF switches are available in two power classes and with 2, 3, or 4 outputs.

    Coaxial cable for the transfer of the specified power
    Coaxial cable

    TRUMPF Hüttinger offers coaxial cables that are specifically designed for operation in 50-ohm systems for RF power transmission.

    Generator and matchbox: A perfectly matched system solution

    Perfectly matched: The TRUMPF RF System

    Plasma processes behave like a complex, variable load, to which the power supply from the generator needs to be continually adjusted. Active matchboxes handle this task, ensuring precise adjustment to the optimal impedance of 50 ohms at all times. The result is a perfectly matched system solution, the TRUMPF RF System. The generator and matchbox can be easily integrated into your existing process environment via various interfaces, including EtherCAT. You can also gain an optimized system solution through an intelligent generator/matchbox connection, the so-called SystemPort.

    This product range and information may vary depending on the country. Subject to changes to technology, equipment, price, and range of accessories. Please get in touch with your local contact person to find out whether the product is available in your country.

    Footnotes
    • The cooling water temperature must exceed the dew point of the room air temperature to ensure no condensation.

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    Individualized customer training is our strong point

    Experienced service engineers teach in-depth knowledge that is tailored to the requirements of the participants.

    Contact

    Klaus Nock
    Plasma Sales
    Fax: +49 761 89711150
    E-mail

    Downloads

    TruPlasma RF System brochure
    TruPlasma RF System brochure
    pdf - 6 MB
    TruPlasma VHF Series 3000 flyer
    pdf - 1 MB
    Whitepaper LDMOS
    pdf - 3 MB
    Whitepaper Precision in Processing
    pdf - 2 MB
    Service & contact