We use cookies for the provision and functionality of this website. Please click here if we may use cookies for other purposes, as well. Information about deactivating cookies and about data privacy

Reactive Sputtering

Producing Oxides and Nitrides Economically

Titanium, silver, zinc, aluminum or silicon targets can be sputtered in a reactive sputtering process just as in passive sputtering. However, the atoms that form the film on the substrate come from both the target material and the gaseous stage.

Titanium, silver, zinc, aluminum or silicon targets can be sputtered in a reactive sputtering process just as in passive sputtering. However, the atoms that form the film on the substrate come from both the target material and the gaseous stage.

Products

Service & contact

Close

Country/region and language selection

Please take note of

You have selected Sweden. Based on your configuration, United States might be more suitable. Would you like to keep or change the selection?

Sweden
United States

Or, select a country or a region.