Our professional arc management solutions
We offer matching arc management systems that meet the requirements of a variety of processes. This enables the generator to respond to the arc quickly and precisely. The innovative sensors improve processing results and increase productivity. We offer improved output at the same price without the need to purchase additional hardware.
MF Plasma Excitation from TRUMPF Hüttinger is above all used in dual cathode systems, for example, dual magnetron sputtering.
DC Pulsed Plasma Excitation from TRUMPF Hüttinger is ideally suited for use in numerous reactive processes.
Direct current generators from TRUMPF Hüttinger are classics when it comes to DC plasma excitation.
TruPlasma radio frequency generators from TRUMPF Hüttinger provide the highest process stability of all power supplies for plasma excitation.