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Reactive Sputtering

Producing Oxides and Nitrides Economically

Solarzellenherstellung

Titanium, silver, zinc, aluminum or silicon targets can be sputtered in a reactive sputtering process just as in passive sputtering. However, the atoms that form the film on the substrate come from both the target material and the gaseous stage.

Titanium, silver, zinc, aluminum or silicon targets can be sputtered in a reactive sputtering process just as in passive sputtering. However, the atoms that form the film on the substrate come from both the target material and the gaseous stage.

Products

TruPlasma MF Serie 7000 (G2)
TruPlasma MF Series 7000

The best in its class

Bipolar-Generator TruPlasma Bipolar 4040
TruPlasma Bipolar Series 4000 (G2)

Maximum power on a flexible wave

Contact

Dr. Daniel Krausse
Plasma RF
E-mail

Dr. Jan Peter Engelstädter
Plasma MF
E-mail
Service & contact