We use cookies for the provision and functionality of this website. If you agree that we can use cookies for other purposes please click here. Information on deactivating cookies and data protection
TRUMPF Laser Amplifier zur Herstellung von Hochleistungschips
TRUMPF Laser Amplifier zur Herstellung von Hochleistungschips
CO2 lasers

TRUMPF Laser Amplifier

With its laser pulse, it provides the starting point for the future production of microchips.

EUV Lithogaphy – enabling progress in the digital era

EUV lithography wins the race for the microchip production method of the future. For many years, the semi-conductor industry has been looking for a cost-efficient and mass-production process to expose even smaller structures on silicon wafers. ASML, Zeiss, and TRUMPF joined forces to develop a technology to produce extreme ultraviolet (EUV) light with a wavelength of 13.5 nanometers for industrial use: In a vacuum chamber, a droplet generator shoots 50,000 tiny tin droplets per second. Each of these droplets is hit by one of the 50,000 laser pulses and turned into plasma. This produces EUV light, which is directed by a mirror onto the wafers to be exposed. The laser pulse for the plasma radiation is provided by a pulsable CO2 laser system developed by TRUMPF – the TRUMPF Laser Amplifier.

From a few watts to 40 kilowatts

The TRUMPF Laser Amplifier sequentially amplifies a laser pulse by more than 10,000 times.

Efficient and reliable

By emitting a pre pulse as well as a main pulse, the full power of the Laser Amplifier can be transferred to the tin droplet.

New application for the CO2 laser

The basis of the high-power laser system is a CO2 laser with continuous wave operation. TRUMPF is thus creating a new application for the technology.

A large network of specialists

Over their years of close collaboration, TRUMPF, ASML, and ZEISS have brought EUV technology to industrial maturity.

457,329

parts

... make up a Laser Amplifier.

37,522

meters of

... cable are built into the system.

17,090

kilos

... is the total weight.

Central components of the TRUMPF Laser Amplifier

Current job vacancies

1

Bewerbertag Produktion & Service TRUMPF Lasersystems for Semiconductor Manufacturing (EUV) am 05.04.2019 in Ditzingen

Production/Quality management, Service/Training Center | Ditzingen / Germany

2

Entwicklungsingenieur (w/m/d) Elektrotechnik für EUV

Research/Development, IT/Software development | Ditzingen / Germany

3

System Engineer (f/m/d) for CO2 laser systems

Research/Development | Ditzingen / Germany

You may also find these topics interesting

Contact
High-power laser systems for EUV lithography
E-mail
Service & contact

Close

Country and language selection

Please note

You have selected Singapore. Based on your configuration, United States might be more appropriate. Do you want to keep or change the selection?

Singapore
United States

Or select a country or region.