MF Plasma Excitation
MF Plasma Excitation from TRUMPF Hüttinger is above all used in dual cathode systems, for example, for dual magnetron sputtering. Due to their high output power and process stability, the medium frequency generators are suited to both the coating of large surfaces of architectural glass with high deposition rates as well as for the application of ultra-thin, homogeneous layers on semi-conductors or solar cells. As a result of their excellent precision and productivity, our MF process power supplies are the ideal solution for numerous applications in plasma excitation.
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