The air-cooled RF generator TruPlasma RF 1001 Air delivers up to 1000 watts of high-precision, reproducible RF energy with an extremely fine resolution – in increments of 100 mW – and is thus suitable for diverse plasma applications. Whether manufacturing semi-conductors, solar cells, or displays – the patented TRUMPF Hüttinger Technology guarantees top reliability and the best process results all round due to modern process functions.
Guarantees optimum and very fast frequency tuning, and thus an optimum interaction between the generator and matchbox.
Safe operation of demanding and new processes ensures your product is protected.
Multi-level, flexible control of the pulse shape for improved process results in modern plasma processes.
Flexible use and replacement of generators possible in the event of process changes or retrofitting.
The patented CombineLine technology guarantees uniform process power due to a true output impedance of 50 ohms.
With various power classes within the RF product family, all process requirements can be met.
In the event of process changes or changes to the system, it is no longer necessary to adjust the cable lengths.
TruPlasma RF Air Series 1000 RF generators are perfectly suited to plasma processes such as reactive-ion etching (RIE), atomic layer deposition (ALD), plasma-enhanced chemical vapor deposition (PECVD), and RF sputtering. These processes are used, among other things, for manufacturing semi-conductor components and micro-electromechanical systems (MEMS) as well as for coating flat screens and solar cells.
Typical areas of application for the TruPlasma RF Air Series 1000 include demanding plasma-enhanced chemical vapor deposition, etching, and RF sputtering processes in the solar industry.
Various plasma processes are used to manufacture semi-conductors, from removal processes such as dry etching to zone refining in the production of pure silicon. The generators from the TruPlasma RF Air Series 1000 provide all of the conditions for a power supply that is stable and optimally adjusted to the respective process, ensuring that you achieve excellent, reproducible results.
TruPlasma RF 1001 Air
|Output power||1 kW|
|Rated output||1 kW|
|Nominal load impedance||50 Ω|
|Output frequency||13.56 MHz|
|Network connection data|
|Line voltage||110 - 230 V|
|Line frequency||50-60 Hz|
|Network input power||1.8 kVA|
|RS 232 / RS 485||Yes|
|IP protection class||20|
|Max. water pressure||N/A bar|
|Min. pressure differential||N/A bar|
|Min. flow rate||N/A l/min|
|Coolant temperature||5 °C - 35 °C|
|Overall efficiency||70 %|
|Certificates / standards||SEMI S2, SEMI F47, UL, CE, RoHs|
|Outside temperature||5 °C - 40 °C|
|Humidity||5 % - 85 %|
|Barometric pressure||79.5 kPa - 106 kPa|
The technical data of all product versions as a download.
Maximum productivity and availability
The flexible, robust design of the RF generators allows the throughput to be increased and the operating costs to be reduced.
Stable processes, reproducible results
The patented CombineLine technology with intelligent real time matching guarantees optimum availability of the TruPlasma RF 1001 Air, and reliably prevents plasma fluctuations and impurities.
Compact and flexible application
Due to the compact design (½-19-inch plug-in unit), the RF generator is very space-saving – ideal for new installations and as a retrofit solution in existing systems. It can be integrated very easily due to numerous available interfaces (configurable analogue interface, Ethernet, DeviceNet, PROFIBUS, EtherCAT).
Accurate to the decimal place
Due to precise energy dosing in increments of 100 mW, top results can be achieved with the TruPlasma RF 1001 Air, even in the most modern and demanding applications, such as atomic layer deposition (ALD). The high-precision power regulation of the RF generator guarantees top wafer-to-wafer repeatability.
Top process results due to modern process functions
Digital control functions, such as smart auto frequency tuning 2.0, arc management and multi-level pulsing allow the RF generator to be optimally adapted to the relevant process.
Flexible adaption to the customer application
Different power classes and frequencies are available in the uniform generator design – this means that it is easier to make replacements in the event of process changes. It is also no longer necessary to adjust the cable lengths.
Control of the complete RF system via the TRUMPF SystemPort
SystemPort enables closed loop control by measuring the RF signal directly at the input and output of the matchbox, meaning that all measured values are always available to the RF generator. The process parameters are continuously monitored, the matchbox is protected, and early arc detection is ensured.
The patented auto frequency tuning solution enables simultaneous and fast frequency tuning between the generator and matchbox. Best process results and top reproducibility are thus guaranteed.
Well thought-out arc management ensures optimum control of the plasma process. Productivity is increased due to targeted arc detection; at the same time, the product and system are protected against damage.
The latest plasma processes require increased flexibility during the pulsing mode. Any type of pulse shape can be achieved with the multi-level, freely-selectable pulsing mode. This results in a new control mechanism in plasma physics and in improved process results.
The synchronization module allows flexible and safer synchronization of multiple generators in complex plasma systems.
The easy-to-use control software enables convenient start-up and secure monitoring of the RF generator or the entire TRUMPF RF system during the ongoing process.
The integrated web server enables both RF system operation and software updates via a web browser.
This product range and information may vary depending on the country. Subject to changes to technology, equipment, price, and range of accessories. Please get in touch with your local contact person to find out whether the product is available in your country.