| 08:00 - 09:00 | Conference registration | |
| 09:00 - 09:30 | Welcome – start of the conference | |
| | Session 1 – Digital transformation | |
| 09:30 - 09:55 | Digitalization and computational engineering for plasma coaters | Prof. Dr.-Ing. Christoph Herrmann, Fraunhofer IST, DE |
| 09:55 - 10:00 | Motto stop | |
| 10:00 - 10:20 | IoT services – connected benefits for MF power supplies | Dr. Jan-Peter Engelstädter, TRUMPF Hüttinger, DE |
| 10:20 - 10:40 | Digitalization of industrial vacuum coating – automated process control & data analysis | Dr. Frank Benecke, Von Ardenne, DE |
| 10:40 - 11:00 | Get together: Time2Network | |
| | Session 2 – Challenges and opportunities in glass coating | |
| 11:00 - 11:25 | Metallic glass coatings with beneficial properties by HiPIMS: a comparison study | Prof. Jinn P. Chu, National Taiwan University, TW |
| 11:25 - 11:30 | Motto stop | |
| 11:30 - 11:50 | High-quality glass processing by means of ultrashort pulsed lasers | Dr. Marcel Schäfer, TRUMPF, DE |
| 11:50 - 12:10 | Low-temperature deposition of high-performance thermochromic VO2-based coatings for energy saving windows | Prof. Jaroslav Vlcek, University of West Bohemia, CZ |
| 12:10 - 12:30 | Dual magnetron sputtering – sputter rate and efficiency | Dr. Moritz Heintze, TRUMPF Hüttinger, DE |
| 12:30 - 13:30 | Lunch break | |
| | Session 3 – Symposium spotlight:
Semiconductor manufacturing – part 1 | |
| 13:30 - 13:55 | Technical features of next generation plasma enhanced atomic layer deposition (PEALD) | Sang Jean (Greg) Jeon, ASMK, KR |
| 13:55 - 14:00 | Motto stop | |
| 14:00 - 14:20 | Quality @ TRUMPF | Dr. Bartlomiej Bonarski, TRUMPF Hüttinger, PL |
| 14:20 - 14:40 | Technical trends of plasma etching equipment | Dr. Kazuya Nagaseki, Tokyo Electron, JP |
| 14:40 - 15:00 | Get together: Time2Network | |
| | Session 3 – Symposium spotlight:
Semiconductor manufacturing – part 2 | |
| 15:00 - 15:20 | Trends in contemporary semiconductor film deposition technology | Shawn Lee, TES, KR |
| 15:20 - 15:40 | Reactively sputtered high-k dielectric films for electronic and photonic applications | Prof. Robert Mroczynski, Warsaw University of Technology, PL |
| 15:40 - 16:00 | High power dual frequency systems for next generation display applications – advantages, opportunities and challenges | Tonatiuh Rivera Toral, TRUMPF Hüttinger, DE |
| 16:00 - 16:20 | Summary day 1 | |
| 19:00 | Evening event | |
