Für die Bereitstellung und Funktionalität dieser Website nutzen wir Cookies. Wenn wir Cookies auch für weitere Zwecke nutzen dürfen, klicken Sie bitte hier. Informationen zum Deaktivieren von Cookies und Datenschutz

Power Electronics for Plasma Engineering Conference

Save the date: 24. - 26. September
in Zielonka/Warschau, Polen

PE² 2019 - Generating Modern Life

Die 10th Power Electronics for Plasma Engineering Conference wird vom 24. - 26. September 2019 in Zielonka, Polen stattfinden.

Welche Themen bewegen die Anwender? Welche Trends zeichnen sich ab? Wie gestaltet sich die Zukunft auf dem Plasmamarkt? Diese Fragen stehen beim 10-jährigen Jubiläum der Power Electronics for Plasma Engineering Conference (PE²) unter dem Motto "Generating Modern Life" im Mittelpunkt.

 

 

Konferenzgebühren

 

KonferenzgebührenEarly BirdNach dem 01.08.2019
PE²
(inkl. Workshop)
350€500€
PE²
(exkl. Workshop)
250€400€

Anmeldeschluss: 10.09.2019

Die Konferenzsprache ist englisch.

Programm

24.09.2019: Digital transformation, glass coating and semiconductor

08:00 - 09:00

Conference registration

 
09:00 - 09:30

Welcome – start of the conference

 
 

Session 1 – Digital transformation

 
09:30 - 09:55

Digitalization and computational engineering for plasma coaters

Prof. Dr.-Ing. Christoph Herrmann, Fraunhofer IST, DE

09:55 - 10:00

Motto stop

 
10:00 - 10:20

IoT services – connected benefits for MF power supplies

Dr. Jan-Peter Engelstädter, TRUMPF Hüttinger, DE

10:20 - 10:40

Digitalization of industrial vacuum coating – automated process control & data analysis

Dr. Frank Benecke, Von Ardenne, DE

10:40 - 11:00

Get together: Time2Network

 
 

Session 2 – Challenges and opportunities in glass coating

 
11:00 - 11:25

Metallic glass coatings with beneficial properties by HiPIMS: a comparison study

Prof. Jinn P. Chu, National Taiwan University, TW

11:25 - 11:30

Motto stop

 
11:30 - 11:50

High-quality glass processing by means of ultrashort pulsed lasers

Dr. Marcel Schäfer, TRUMPF, DE

11:50 - 12:10

Low-temperature deposition of high-performance thermochromic VO2-based coatings for energy saving windows

Prof. Jaroslav Vlcek, University of West Bohemia, CZ

12:10 - 12:30

Dual magnetron sputtering – sputter rate and efficiency

Dr. Moritz Heintze, TRUMPF Hüttinger, DE

12:30 - 13:30

Lunch break

 
 

Session 3 – Symposium spotlight:
Semiconductor manufacturing – part 1

 
13:30 - 13:55

Technical features of next generation plasma enhanced atomic layer deposition (PEALD)

Sang Jean (Greg) Jeon, ASMK, KR

13:55 - 14:00

Motto stop

 
14:00 - 14:20

Etch process technologies

NN, Samsung Electronic, KR

14:20 - 14:40

Technical trends of plasma etching equipment

Dr. Kazuya Nagaseki, Tokyo Electron, JP

14:40 - 15:00

Get together: Time2Network

 
 

Session 3 – Symposium spotlight:
Semiconductor manufacturing – part 2

 
15:00 - 15:20

Trends in contemporary semiconductor film deposition technology

Seung Moo Lee, Samsung Electronic, KR

15:20 - 15:40

Reactively sputtered high-k dielectric films for electronic and photonic applications

Prof. Robert Mroczynski, Warsaw University of Technology, PL

15:40 - 16:00

High power dual frequency systems for next generation display applications – advantages, opportunities and challenges

Tonatiuh Rivera Toral, TRUMPF Hüttinger, DE

16:00 - 16:20

Quality @ TRUMPF

Dr. Bartlomiej Bonarski, TRUMPF Hüttinger, PL

16:20 - 16:40

Summary day 1

 
18:00

Evening event

 

25.09.2019: Industrial coating, advanced applications and energy harvesting

08:50 - 09:00

Welcome – start of the conference

 
 

Session 4 –
Industrial coating & advanced applications – part 1

 
09:00 - 09:25

Sputtering as key for innovations – some recent results from R+D

Prof. Dr. Günter Bräuer, Fraunhofer IST, DE

09:25 - 09:30

Motto stop

 
09:30 - 09:50

Carbon-based anti-corrosive conductive coatings for PEMFC bipolar plates

Dr. Roel Tietema, Hauzer, NL

09:50 - 10:10

Plasma nitriding at increased voltage

Dr. Peter Kaestner, Technical University of Braunschweig, DE

10:10 - 10:30

Graphene film grown on copper foil by using bipolar HIPIMS for thermal management

Prof. Ju-Liang He, Taiwan University, TW

10:30 - 11:00

Get together: Time2Network

 
 

Session 4 –
Industrial coating & advanced applications –
part 2

 
11:00 - 11:25

Coatings for aerospace

Prof. Jolanta Klemberg-Sapieha, Polytechnique Montréal, CN

11:25 - 11:30

Motto stop

 
11:30 - 11:50

Self-adjustment of the power supply for crazing elimination in large area coating

Krzysztof Ruda, TRUMPF Hüttinger, PL

11:50 - 12:10

Thin films of carbides and carbon-based nanocomposites

Prof. Witold Gulbinski, Koszalin University, PL

12:10 - 13:10

Lunch break

 
13:10 - 14:40

Group picture & company tour

 
14:40 - 15:40

Coffee @ poster session

 
 

Session 5 – Energy harvesting

 
15:40 - 16:05

New display technologies for new opportunities – new kinds of displays grow into multiple new markets

Klaus Wammes, Wammes & Partner, DE

16:05 - 16:30

Inductively coupled heating of pulsed plasmas

Joscha Schmidt, University Gießen, DE

16:30 - 16:50

Effect of HiPIMS pulse parameters on a reactive SiOx deposition process

Prof. Arutiun Ehiasarian, Sheffield Hallam University, UK

16:50 - 17:10

Latest developments in TOPCon PV cells

Dr.-Ing. Jochen Rentsch, Fraunhofer ISE, DE

17:10 - 17:30

Summary day 2

 
18:00

Evening reception

 

26.09.2019: Workshop: Modelling of process and application pit stops

08:50 - 09:00

Welcome, health and safety briefing

 
 

Session 6 – Modelling of deposition process – part 1

 
09:00 - 09:25

Modelling reactive magnetron sputtering: opportunities and challenges

Prof. Dr. Diederik Depla, Ghent University, B

09:25 - 09:45

Modelling of thin film deposition processes as a service

Dr. Andreas Pflug, Fraunhofer IST, DE

09:45 - 10:00

Get together: Time2Network

 
10:00 - 12:15

Application pit stop – part 1

Crazing prevention algorithm, HiPIMS – thinking positive, high power dual frequency systems

12:15 - 13:15

Lunch break

 
 

Session 6 – Modelling of deposition process – part 2

 
13:15 - 13:35

Efficient predictive simulation in thin film coating industry

Petr Zikan, PlasmaSolve, CZ

13:35 - 13:55

Application of design of experiment methods for power supply-related process parameters optimization

Dr Wojciech Gajewski, TRUMPF Hüttinger, PL

13:55 - 14:10

Get together: Time2Network

 
14:10 - 16:25

Application pit stop – part 2

IoT services – connected benefits, managing arcs, multifunctional synchronization

16:25 - 16:35

End of workshop

 

Für 2019 sind bereits alle Vorträge vergeben. Gerne nehmen wir Anmeldungen für 2020 an.

Deadlines

Abstract submission

27. Juni 2019

Paper submission & biography  

06. September 2019

Presentation submission

16. September 2019

Contact: PE2@de.trumpf.com

Anreise und Unterkunft

Wir möchten Ihnen die Anreise nach Zielonka und Ihren Aufenthalt so angenehm wie möglich gestalten. Daher haben wir im Folgenden einige Informationen für Ihre Reiseorganisation zusammengestellt.

Veranstaltungsort

TRUMPF Huettinger Sp. z o.o. 
Marecka 47
05-220 Zielonka
Poland


Telefon: +48 22 7613-800   oder   +49-761-8971-0

In folgenden Hotels haben wir Kontingente für Sie reserviert

Hotel Trylogia
ul. Poniatowskiego 46
05-220 Zielonka
http://hoteltrylogia.pl/en/
34€/Nacht
 

Hotel Mistral
ul. Słoneczna 1
05-270 Marki
https://hotelmistral.pl/en/
44€/Nacht
 

Hotel Mansor
ul. ks. Ignacego Skorupki 3 i 5
05-091 Ząbki
http://www.mansor.pl/
63€/Nacht
 

Hotel U Pietrzaków
ul. Lipowa 20
05-220 Zielonka
http://upietrzakow.pl/
37€/Nacht

 

Die Raumkontingente sind bis zum 01.09.2019 verfügbar. Um diese zu nutzen, geben Sie bei der Buchung bitte "PE Conference" an.

 

 

Anmeldung zur PE²

Bitte nutzen Sie dieses Formular um sich anzumelden.

Ihre Daten



Partner Programm

In diesem Jahr wird ein Partnerprogramm für Begleitpersonen angeboten.

Weitere Informationen in Kürze verfügbar.

 

Kontakt
Team PE²
E-Mail

Downloads

Service & Kontakt

Close

Country/region and language selection

Please take note of

You have selected the international language version "German" of the website. Based on your configuration, United States might be more suitable. Would you like to keep or change the selection?

International German
United States

Or, select a country or a region.