Conference registration

Welcome – start of the conference

Session 1 – Digital transformation

Digitalization and computational engineering for plasma coaters

Prof. Dr.-Ing. Christoph Herrmann, Fraunhofer IST, DE

Motto stop

IoT services – connected benefits for MF power supplies

Dr. Jan-Peter Engelstädter, TRUMPF Hüttinger, DE

Digitalization of industrial vacuum coating – automated process control & data analysis

Dr. Frank Benecke, Von Ardenne, DE

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Session 2 – Challenges and opportunities in glass coating

Metallic glass coatings with beneficial properties by HiPIMS: a comparison study

Prof. Jinn P. Chu, National Taiwan University, TW

Motto stop

High-quality glass processing by means of ultrashort pulsed lasers

Dr. Marcel Schäfer, TRUMPF, DE

Low-temperature deposition of high-performance thermochromic VO2-based coatings for energy saving windows

Prof. Jaroslav Vlcek, University of West Bohemia, CZ

Dual magnetron sputtering – sputter rate and efficiency

Dr. Moritz Heintze, TRUMPF Hüttinger, DE

Lunch break

Session 3 – Symposium spotlight:
Semiconductor manufacturing – part 1

Technical features of next generation plasma enhanced atomic layer deposition (PEALD)

Sang Jean (Greg) Jeon, ASMK, KR

Motto stop

Etch process technologies

NN, Samsung Electronic, KR

Technical trends of plasma etching equipment

Dr. Kazuya Nagaseki, Tokyo Electron, JP

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Session 3 – Symposium spotlight:
Semiconductor manufacturing – part 2

Trends in contemporary semiconductor film deposition technology

Seung Moo Lee, Samsung Electronic, KR

Reactively sputtered high-k dielectric films for electronic and photonic applications

Prof. Robert Mroczynski, Warsaw University of Technology, PL

High power dual frequency systems for next generation display applications – advantages, opportunities and challenges

Tonatiuh Rivera Toral, TRUMPF Hüttinger, DE

Quality @ TRUMPF

Dr. Bartlomiej Bonarski, TRUMPF Hüttinger, PL

Summary day 1

Evening event

Welcome – start of the conference

Session 4 –
Industrial coating & advanced applications – part 1

Sputtering as key for innovations – some recent results from R+D

Prof. Dr. Günter Bräuer, Fraunhofer IST, DE

Motto stop

Carbon-based anti-corrosive conductive coatings for PEMFC bipolar plates

Dr. Roel Tietema, Hauzer, NL

Plasma nitriding at increased voltage

Dr. Peter Kaestner, Technical University of Braunschweig, DE

Graphene film grown on copper foil by using bipolar HIPIMS for thermal management

Prof. Ju-Liang He, Taiwan University, TW

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Session 4 –
Industrial coating & advanced applications –
part 2

Coatings for aerospace

Prof. Jolanta Klemberg-Sapieha, Polytechnique Montréal, CN

Motto stop

Self-adjustment of the power supply for crazing elimination in large area coating

Krzysztof Ruda, TRUMPF Hüttinger, PL

Thin films of carbides and carbon-based nanocomposites

Prof. Witold Gulbinski, Koszalin University, PL

Lunch break

Group picture & company tour

Coffee @ poster session

Session 5 – Energy harvesting

New display technologies for new opportunities – new kinds of displays grow into multiple new markets

Klaus Wammes, Wammes & Partner, DE

Inductively coupled heating of pulsed plasmas

Joscha Schmidt, University Gießen, DE

Effect of HiPIMS pulse parameters on a reactive SiOx deposition process

Prof. Arutiun Ehiasarian, Sheffield Hallam University, UK

Latest developments in TOPCon PV cells

Dr.-Ing. Jochen Rentsch, Fraunhofer ISE, DE

Summary day 2

Evening reception