Country/region and language selection

Epitaxy

Clean growth layer by layer

Epitaxy

Epitaxy is a process in which single crystalline layers, e.g. of silicon, are created on single crystal substrates of the same material. The substrates are located on an inductively heated graphite susceptor. This requires a very high degree of temperature homogeneity. Epitaxy is used, for example, in manufacturing LEDs. TRUMPF Hüttinger medium-frequency generators provide the necessary process energy reliably and stably.

Products

Contact
Dr. Torge Behrens
Induction heating
Email
Service & contact