TruPlasma MF Series 7000 (G2)

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Arc management

The creation of arcs during MF magnetron sputtering: A well-known problem during reactive magnetron sputtering is the arc formation at the cathodes.

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Sine or square wave

Since the introduction of dual magnetron sputtering (DMS) for highly insulating layers, it is possible to choose between a square wave pulse and sine wave power supply.

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Voltage controlled transition mode

Reactive sputtering is a largely successful method used in modern industry to create insulating coatings and hard coatings. In comparison with evaporation, sputtering offers the benefits of the ion-assisted coating, which makes it attractive for the industry despite considerable system and electricity costs.

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