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Article about EUV lithography | TRUMPF
Article collection for EUV lithography

Reflected in the media: EUV lithography

Without a doubt, using extreme ultraviolet radiation (EUV) for wafer exposure is the next big thing in the chip industry. It's no wonder then that both trade publications and the general media regularly hone in on this particular topic and follow any technological developments. You will find a collection of some national and international highlight articles on this page.

Samsung's 5-nm EUV process technology is ready

In this article, author Marc Sauter reports that Samsung Foundry has completed  development on the 5-nm process technology with extreme ultra-violet radiation (EUV), and will be accepting customer orders immediately. This new process allows a 25% increase in transistor density, while the chips exhibit a power input that is 20% lower, and a processing power that is 10% higher.

Author: Marc Sauter
Date of publication: 04/2019
Link: to article

Samsung manufactures 7-nanometre chips using EUV exposure units

In this article, reports that in autumn 2018, Samsung started production in its first factory dedicated to 7 nm, where it exposes wafers with the EUV lithography system from ASML. Source:
Author: Nico Ernst
Date of publication: 10/2018
Link: to article

Ahead of the curve

The TRUMPF 2017/2018 annual report highlights how controlling light – and, with that, lasers and EUV lithography – lays the foundation for future technologies such as artificial intelligence, autonomous driving and networked factories.

Source: TRUMPF annual report for fiscal year 2017/2018
Author: TRUMPF GmbH + Co. KG
Date of publication: 10/2018
Link: to article

EUV scanner availability increased to 85 percent

This article announces that ASML has improved its NXW:3400B systems so significantly that cost and time-efficient series production using extreme ultraviolet radiation is within reach. Source:
Author: Marc Sauter
Date of publication: 07/2018
Link: to article

The secret of EUV generation

In this article, LaserFocusWorld traces the development of EUV technology, which spans a period of more than two decades, and explores the numerous hurdles and challenges that had to be overcome before the breakthrough in 2015.

Source: LaserFocusWorld
Author: Andreas Thoss
Date of publication: 11/2017
Link: to article

TRUMPF consolidates EUV lithography supply chain with Access Laser deal

This report in the trade publication "Produktion" concerns TRUMPF's majority takeover of Access. As the manufacturer of low-power CO2 lasers, Access Laser is one of the most important partners in TRUMPF's EUV business. Source:
Author: anonymous
Date of publication: 10/2017
Link: to article

TRUMPF wants to cause a stir in the chip industry

The "Stuttgarter Zeitung" newspaper reports how TRUMPF, with its laser amplifier, has entered the semi-conductor industry as a supplier and founded a new subsidiary for the business. Source: Stuttgarter Zeitung
Author: Michael Heller
Date of publication: 05/2017
Link: to article

EUV has arrived in IC production

This article in weekly electronics magazine, "Markt&Technik", summarises ASML's current and planned turnover and sales volume, both of which prove that EUV lithography has finally arrived on the industrial stage. Source: Markt&Technik
Author: Heinz Arnold
Date of publication: 07/2017
Link: to article

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