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DC Plasma Excitation technology

Plasma Excitation

The plasma generators from TRUMPF Hüttinger provide the process stability required for many high-tech industries and make functional coating of solar cells and microchips possible, as well as coating of large surfaces of architectural glass and the manufacture of semi-conductor elements and flat screens. They are some of the front runners on the market thanks to their outstanding precision, energy efficiency and high process stability.

MF Plasma Excitation

They are the ideal solution for numerous applications in plasma excitation thanks to outstanding precision and productivity.

DC Pulsed Plasma Excitation

DC pulsed plasma excitation from TRUMPF Hüttinger is ideal for use in numerous reactive processes.

DC Plasma Excitation

Direct current generators from TRUMPF Hüttinger are classics when it comes to DC plasma excitation.

RF Plasma Excitation

The first choice for demanding applications such as the manufacture of semi-conductor elements, microchips, solar cells or flat screens.



The solid-state-based plasma generators of the TruPlasma MW Series consist of an innovative platform concept and generate maximum plasma densities for demanding process requirements. Diverse plasma parameters can be optimally set for the desired application thanks to the nano pulses.


TruPlasma Bipolar Series 4000 (G2.1)

The process power supplies of the TruPlasma Bipolar Series 4000 (G2.1) deliver excellent results in the production of solar cells and semi-conductors, in the application of decorative and wear-resistant layers, and in the coating of architectural glass with flexibly formable output signals and sophisticated arc management. The latest generation of generators are ideally suited for demanding plasma processes, such as reactive sputtering, PVD, and PECVD.

TruPlasma MF Series 7000 (G2)

With the TruPlasma Series MF 7000 (G2) MF generators you always have complete control of your process – resulting in excellent layer qualities and optimum productivity, even for the demanding coating of large areas. Featuring peak efficiencies of over 90%, these power supplies of the latest generation are also extremely cost-effective to operate.

DC-gepulste Plasmageneratoren

TruPlasma Highpulse Series 4000 (G2)

The process power supplies of the TruPlasma Highpulse Series 4000 (G2) deliver particularly corrosion-resistant and wear-resistant hard material coatings and are the first choice for HiPIMS applications. In combination with polarized substrates, the TruPlasma Highpulse Series 4000 (G2) can also serve semi-conductor applications such as trench filling, surface pretreatment, and etching.

TruPlasma DC Series 4000 (G2)

The TruPlasma DC Series 4000 (G2) combines the excellent arc handling of TRUMPF Hüttinger with the advantages of DC pulse technology. This means you gain improved coating results with fewer defects, along with a higher deposition rate. The results are brilliant surfaces and a high level of production power.


TruPlasma DC Series 3000 (G2)

As a new generation of DC generators, the TruPlasma DC Series 3000 (G2) is suited to numerous DC sputtering processes. The DC generators also make an interesting cost-effective alternative to pulsed DC generators due to their progressive arc management and the integrated water cooling. The very compact design also enables simple integration into existing applications.

TruPlasma Arc Series 3000

The TruPlasma Arc Series 3000 generators are particularly impressive for hard material and decorative coatings. With its compact design and air cooling, valuable space is optimized and the unit can be easily integrated into new or existing systems.


TruPlasma RF Air Series 1000

The air-cooled RF generator TruPlasma RF 1001 Air delivers up to 1000 watts of high-precision, reproducible RF energy with an extremely fine resolution – in increments of 100 mW – and is thus suitable for diverse plasma applications. Whether manufacturing semi-conductors, solar cells, or displays – the patented TRUMPF Hüttinger Technology guarantees top availability and the best process results throughout due to modern process functions.

TruPlasma RF Series 1000 / 3000 (G2/13)

The TruPlasma RF Series 1000 / 3000 (G2/13) are the latest generation of RF generators. Due to innovative functions such as the patented CombineLine coupling technology or real-time measurement of all process parameters, reliable power supply even in demanding plasma processes is guaranteed – the optimal conditions for reproducible results and high productivity.

TruPlasma RF Series 3000

The powerful RF generators of the TruPlasma RF Series 3000 are characterized by the highest efficiency and process stability. They are therefore, perfectly suited for demanding plasma processes such as those used during the production of semi-conductors, photovoltaic cells, or flat screens. Matchboxes for impedance matching that are perfectly adapted to the generator ensure the optimal and stable power transfer from the generator to the plasma at all times.

TruPlasma VHF Series 3000

The highest power for your process: The generators of the TruPlasma VHF series 3000 are based on an innovative platform concept which meets even the toughest process demands. The modular design of the VHF generators, which are purely cooled by water, enables the output power to be scaled by up to 80 kW – and this with the smallest footprint!

TruPlasma Match Series 1000 (G2/13)

The exact matching of the output impedance of the RF generator is decisive for an optimal plasma process. This is achieved by the matchboxes of the TruPlasma Match Series 1000 (G2/13) as a link between the generator and the process. This results in a comprehensive solution for your process power supply – the TRUMPF RF system.

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