Semicon Europe trade fair: TRUMPF makes semiconductor manufacturing more efficient and precise

Freiburg/Munich, 12 November 2025 – TRUMPF ensures greater precision and efficiency in semiconductor manufacturing. To this end, the high-tech company has developed a new generation of its high-frequency power supplies with the TruPlasma RF Series G3. “The system enables microchip manufacturers to achieve more stable plasma processes, thereby reducing production costs and increasing chip quality,” says Michael Ehinger, responsible for sales of electronics solutions for the semiconductor industry at TRUMPF. The company is presenting the new TruPlasma RF Series G3 at the Semicon Europa trade fair in Munich.

Energy-efficient chip manufacturing

The modular platform offers power levels from 2.5 to 10 kW and can be flexibly integrated into existing tools. Users can also easily upgrade older tools with it. At the same time, they benefit from improved energy efficiency. The new generation of the TruPlasma RF Series G3 consumes 20 percent less power and generates less waste heat. This reduces operating costs and protects the environment.

Real-time monitoring increases quality

Users can manufacture chips more efficiently with the TruPlasma RF Series G3, thereby reducing their production costs. During plasma etching, for example, the system continuously measures the reaction of the plasma and adjusts the energy in real time. This ensures stable manufacturing processes and consistent layer quality across the entire wafer. The integrated, browser-based user interface allows all process parameters to be monitored and modified easily and efficiently during system qualification without having to install additional software.

このプレス情報には、それに合うデジタル画像が印刷に適した解像度で用意されています。 これは出版物の編集目的でのみ使用が許可されています。使用は、「画像：TRUMPF」と出典を明記すれば無料です。背景の削除を除いて、画像に変更を加えることは禁止されています。 その他の画像がTRUMPFメディアプールから呼び出し可能です。