Close and exclusive partnership with ASML enables chip manufacturers worldwide to create more reliable and resource-saving lithography systems // TRUMPF sets new standards in efficiency and sustainability in chip production with innovative design
ASML honors TRUMPF for new EUV laser
Veldhoven/Ditzingen, October 24, 2025 – Yesterday, the Dutch technology company ASML honored TRUMPF with the prestigious Supplier Award in the "Technology" category. The occasion marks the successful development and the “first light” of a new EUV high-energy laser, which is intended to provide the world's most powerful microchips in ASML's next generation of EUV lithography systems. TRUMPF recently successfully tested the laser for the first time, and series production is scheduled to begin in 2026.
“ASML is very much looking forward to receiving the new TRUMPF lasers as they are intended to increase availability and power of our EUV products at lower energy consumption” says Sheila Leenders, Senior Vice President Strategic Sourcing and Procurement at ASML.
With more than 450,000 individual parts and a weight of over 20 tons, the new EUV laser marks a milestone in semiconductor manufacturing. The system was fundamentally redeveloped by TRUMPF to further increase reliability and availability in the chip factories. At the same time, the new laser consumes less energy and thus contributes to resource conservation and CO₂ reduction.
"The award from ASML is a special recognition of the commitment and innovative strength of our team. At the same time, it underlines the importance of the close partnership with ASML. As a technology leader in the semiconductor industry, the company continues to set new standards in terms of sustainability and innovation. Together, we are driving the development of forward-looking solutions for chip manufacturing," said Volker Jacobsen, CEO EUV at TRUMPF.
The award was presented at the ASML Suppliers' Day on 23 October 2025. The first new high-energy lasers are scheduled to be delivered to ASML in 2026.
Matching digital images in printable resolution are available for this press release. These may only be used for editorial purposes. The use is free of charge if the source is quoted "Photo: TRUMPF". Graphic changes – except for cropping the main motif – are not permitted. More photos are available in the TRUMPF Media Pool .
TRUMPF EUV
Mirror assembly in the TRUMPF clean room for the production of the EUV laser system. (Source: TRUMPF)
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Mirror assembly in the TRUMPF clean room for the production of the EUV laser system. (Source: TRUMPF)
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